Technical Articles
Sputtering film targets can be roughly divided into mechanical and physical functional films according to their different functions and applications
The working principle of magnetron sputtering is that electrons collide with argon atoms in the process of flying to the substrate under the action of electric field E
Magnetron sputtering coater is characterized by setting up a circular magnetic target on the cathode surface to control the movement of the secondary electrons.
Vacuum coating process is very complex; due to the coating principle is divided into many types, only because of the need for high vacuum and has a unified name. So for different principles of vacuum coating, the factors affecting uniformity are not the same
For different principles of vacuum coating, the factors that affect the uniformity are also different. And the concept of uniformity itself will have different meanings depending on the scale of the coating and the composition of the film.
Spark plasma sintering is currently one of the most advanced sintering technologies used to prepare functional materials in the world. It is widely used in fast and high-quality sintering of nanomaterials, magnetic materials, electronic materials, fine ceramics, amorphous alloys, hard alloys and composite materials.
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